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Smartgeometry 2012 Troy

Smartgeometry is pleased to announce that sg2012 will be at Rensselaer Polytechnic Institute, Troy, in upstate New York from 19-24 March 2012. The Workshop and conference will be a gathering of the global community of innovators and pioneers in the fields of architecture, design and engineering.
 
The event will be in two parts, a four-day Workshop 19-22 March, and a public conference beginning with Talkshop 23 March, followed by a Symposium 24 March. The event follows the format of the highly successful preceding events sg2010 Barcelona and sg2011 Copenhagen.
 

Workshop
The SG Workshop is a unique creative cauldron attracting attendees from across the world of academia, professional practice as well as many of the brightest students. The Workshop is open to 100 applicants who come together for four intensive days of design and collaboration.
 
The annual Workshop is organised around Clusters. Clusters are hubs of expertise comprising of people, knowledge, tools, materials and machines. The Clusters provide a focus for Workshop participants working together, within a common framework.
 
Talkshop
After four intense days of innovative work, Talkshop offers an opportunity for critical reflection on what has been accomplished in the Workshop. Talkshop will be an opportunity to open debates, pose questions, challenge orthodoxies, and propose new ideas.
 
Talkshop will feature informal and open discussions between Cluster participants, leading practitioners and emerging talents in digital design, offering inside perspectives on how the landscape of computational design is reshaping built form.
 

Symposium
The Symposium will examine the year's Challenge. Invited keynote speakers will showcase major projects and research from around the globe that mark out the territory of the year's Challenge. The Symposium is a unique opportunity to hear insights into the challenges ahead for the discipline.
 
Interwoven throughout the day will be reports and highlights from each Workshop Cluster, giving an opportunity to view work created during the previous four days of intensive collaboration, design and development.